Destination 2D Intellectual Property
Securing the Future of CMOS Interconnects
Industry’s First & Only 300MM Low-Temperature (300-400 °C) Transfer-Free Graphene Synthesis Tool, Fully Compatible with Standard CMOS Process
Breakthrough and Patented High-Quality, BEOL-Compatible MLG Growth Process
Unique Material Stack for MLG Growth Process
BEOL-Compatible Intercalation Doping of MLG
On-Chip Multi-Level Graphene Interconnect & Via Structures
